| CPC G02B 7/003 (2013.01) [G01J 1/0455 (2013.01); G01J 1/4257 (2013.01); G01J 1/429 (2013.01); G02B 26/101 (2013.01); G03F 7/70258 (2013.01); G03F 7/70558 (2013.01)] | 25 Claims |
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1. A method of optimizing a laser beam of coherent collimated light in a photolithography system, the laser beam of coherent collimated light traversing an optical train comprising a plurality of optical components, the method comprising:
moving a first optical component of the optical train such that the laser beam of coherent collimated light when exiting the first optical component scans, responsive to moving the first optical component, at least partially across a first sensor face;
forming a correlation, using data obtained from the first sensor face during moving the first optical component, between the physical disposition of the first optical component and a point of impact of the laser beam of coherent collimated light;
ascertaining a first physical disposition of the first optical component, using data obtained from the correlation, that would cause the point of impact of the laser beam of coherent collimated light that exits the first optical component to impact a desired point on a second optical component of the optical train; and
aligning the laser beam of coherent collimated light that exits the first optical component with respect to the second optical component by disposing the first optical component in accordance with the first physical disposition.
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