US 12,203,828 B2
Method and system for detecting anomalies in a semiconductor processing system
Ryan T. Downey, San Jose, CA (US); Hemant P. Mungekar, Campbell, CA (US); James L'Heureux, Santa Clara, CA (US); Andreas Neuber, Stuttgart (DE); Michael W. Johnson, Austin, TX (US); Joseph A. Van Gompel, Austin, TX (US); Gino Gerardo Crispieri, Austin, TX (US); Tony H. Tong, Dublin, CA (US); Maxime Cayer, Chandler, AZ (US); John L Koenig, Cedar Park, TX (US); and Mike M. Huang, Hsinchu (TW)
Assigned to Applied Materials, Inc., Santa Clara, CA (US)
Filed by Applied Materials, Inc., Santa Clara, CA (US)
Filed on Apr. 26, 2021, as Appl. No. 17/240,677.
Prior Publication US 2022/0341821 A1, Oct. 27, 2022
Int. Cl. G01M 99/00 (2011.01)
CPC G01M 99/008 (2013.01) 14 Claims
OG exemplary drawing
 
1. A system comprising:
a semiconductor processing system comprising a substrate processing chamber, a first communication channel, a pump comprising an intrinsic sensor and an external sensor, the pump being external from the substrate processing chamber;
a memory comprising computer-readable instructions; and
a processor coupled to the memory, the processor configured by the computer-readable instructions to cause the processor to execute a method for detecting anomalies in the semiconductor processing system, the method comprising:
receiving a processing chamber attribute of the substrate processing chamber;
receiving sub-fab sensor data from the pump, wherein receiving the sub-fab sensor data comprises receiving intrinsic sensor data from the intrinsic sensor via the first communication channel and receiving external sensor data from the external sensor via a second communication channel being different from the first communication channel;
generating virtual sensor data based on the processing chamber attribute and the sub-fab sensor data, the virtual sensor data correlating the intrinsic sensor data, the external sensor data, the processing chamber attribute, and a plurality of thresholds along a same time axis, the plurality of thresholds comprising a first threshold that causes generating a warning signal for an intervention action of the pump and a second threshold indicating a failure of the pump; and
performing, based on the virtual sensor data, a maintenance operation of the semiconductor processing system, the maintenance operation comprising decommissioning the pump, altering an operation of the pump, changing a processing recipe for a tool coupled to the pump, closing down the tool, or rerouting a substrate to another semiconductor processing system.