US 12,202,230 B2
Reddening-resistant layer
Jin Seok Byun, Daejeon (KR); Yeong Rae Chang, Daejeon (KR); Na Young Shin, Daejeon (KR); Kyun Il Rah, Daejeon (KR); and Jae Pil Koo, Daejeon (KR)
Assigned to LG Chem, Ltd., Seoul (KR)
Appl. No. 17/441,658
Filed by LG CHEM, LTD., Seoul (KR)
PCT Filed Jan. 31, 2020, PCT No. PCT/KR2020/001470
§ 371(c)(1), (2) Date Sep. 21, 2021,
PCT Pub. No. WO2020/204339, PCT Pub. Date Oct. 8, 2020.
Claims priority of application No. 10-2019-0037453 (KR), filed on Mar. 29, 2019.
Prior Publication US 2022/0146775 A1, May 12, 2022
Int. Cl. B32B 17/10 (2006.01); B32B 7/12 (2006.01); C08J 5/18 (2006.01); G02B 5/30 (2006.01); G02B 7/00 (2021.01); B32B 3/30 (2006.01); B32B 27/14 (2006.01)
CPC B32B 17/10458 (2013.01) [B32B 7/12 (2013.01); B32B 17/10018 (2013.01); B32B 17/10238 (2013.01); B32B 17/10614 (2013.01); C08J 5/18 (2013.01); G02B 5/3041 (2013.01); G02B 7/008 (2013.01); B32B 3/30 (2013.01); B32B 27/14 (2013.01); B32B 2264/203 (2020.08); B32B 2264/301 (2020.08); B32B 2264/305 (2020.08); B32B 2307/732 (2013.01); B32B 2457/20 (2013.01); C08J 2329/04 (2013.01); C08J 2347/00 (2013.01); C08J 2401/12 (2013.01)] 12 Claims
OG exemplary drawing
 
1. A reddening-resistant layer that is a void-containing layer or that comprises the void-containing layer,
wherein the void-containing layer exhibits a peak within a scattering vector range of 0.06 to 0.209 nm−1 in a log value graph of scattering intensity of small angle X-ray scattering,
wherein the void-containing layer includes at least one surface having a surface area ratio of 0.02 or more as measured by an atomic force microscope (AFM), and
wherein the void-containing layer satisfies Equation 4:
HL≤0.9×HP  [Equation 4]
wherein HL is a thermal diffusivity of a laminate of a polymer film and the void-containing layer formed on one side of the polymer film, and HP is the thermal diffusivity of the polymer film.