CPC B24B 41/005 (2013.01) [B24B 29/00 (2013.01); B24B 49/186 (2013.01)] | 20 Claims |
1. A method for in-situ chemical mechanical polishing (CMP) pad replacement in an associated CMP tool, comprising:
receiving, at a controller including a processor in communication with memory, an output from a pad wear detection module corresponding to a state of a CMP pad on a first platen of a plurality of platens of a platen carrier;
positioning a pad tape replacement module proximate to the first platen responsive to an output of the pad wear detection module, the pad tape replacement module including a pad tape supply having a plurality of pads disposed therein;
rotating the platen carrier toward a pad tearer tool movably positioned adjacent to the platen carrier;
engaging the pad tearer tool to remove the CMP pad on the first platen; and
rolling, via a pressure roller of the pad tape replacement module, a pad disposed in the pad tape supply onto a second platen of the plurality of platens of the platen carrier.
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