US 11,876,054 B2
Overlay mark and method of making
Chen-Yu Chen, Hsinchu (TW); Ming-Feng Shieh, Hsinchu (TW); and Ching-Yu Chang, Hsinchu (TW)
Assigned to TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD., Hsinchu (TW)
Filed by TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD., Hsinchu (TW)
Filed on May 18, 2021, as Appl. No. 17/323,396.
Application 17/323,396 is a continuation of application No. 16/546,778, filed on Aug. 21, 2019, granted, now 11,037,882.
Application 16/546,778 is a continuation of application No. 16/207,056, filed on Nov. 30, 2018, granted, now 10,424,543, issued on Sep. 24, 2019.
Application 16/207,056 is a continuation of application No. 16/048,018, filed on Jul. 27, 2018, granted, now 10,249,570, issued on Apr. 2, 2019.
Application 16/048,018 is a continuation of application No. 14/551,653, filed on Nov. 24, 2014, granted, now 10,043,759, issued on Aug. 7, 2018.
Application 14/551,653 is a continuation of application No. 13/536,855, filed on Jun. 28, 2012, granted, now 8,908,181, issued on Dec. 9, 2014.
Prior Publication US 2021/0272911 A1, Sep. 2, 2021
Int. Cl. H01L 23/544 (2006.01); G03F 7/00 (2006.01); H01L 21/302 (2006.01); H01L 29/06 (2006.01); H01L 29/78 (2006.01)
CPC H01L 23/544 (2013.01) [G03F 7/70633 (2013.01); G03F 7/70683 (2013.01); H01L 21/302 (2013.01); H01L 29/0649 (2013.01); H01L 29/78 (2013.01); H01L 2924/0002 (2013.01)] 20 Claims
OG exemplary drawing
 
1. An overlay mark, comprising:
a first feature extending in an X-direction, wherein the first feature is a first distance from a substrate;
a second feature extending in a Y-direction perpendicular to the X-direction, wherein the second feature is a second distance from the substrate, and the second distance is different from the first distance, wherein at least one of the first feature or the second feature comprises a conductive material; and
a third feature extending in the X-direction and the Y-direction, wherein the third feature is a continuous feature, the third feature is a third distance from the substrate, and the third distance is different from the first distance and the second distance, and
wherein the first distance, the second distance and the third distance from the substrate are along a Z-direction perpendicular to both the X-direction and the Y-direction.