US 11,875,968 B2
High frequency power source allowing arbitrary setting of temporal change pattern for high frequency output power
Toshihiro Takahara, Hiroshima (JP); Takamichi Kishira, Hiroshima (JP); and Katsunori Tanaka, Hiroshima (JP)
Assigned to Adtec Plasma Technology Co., Ltd., Hiroshima (JP)
Filed by Adtec Plasma Technology Co., Ltd., Hiroshima (JP)
Filed on Nov. 22, 2021, as Appl. No. 17/533,037.
Claims priority of application No. 2021-041256 (JP), filed on Mar. 15, 2021.
Prior Publication US 2022/0293393 A1, Sep. 15, 2022
Int. Cl. H01J 37/32 (2006.01); H05H 1/46 (2006.01)
CPC H01J 37/32036 (2013.01) [H01J 37/32045 (2013.01); H01J 37/32935 (2013.01); H05H 1/46 (2013.01)] 7 Claims
OG exemplary drawing
 
1. A high frequency power source outputting high frequency power to a load via an impedance matching circuit whose circuit constants are changed, the source comprising:
an output portion configured to output the high frequency power;
a data storage portion configured to store command data created by a user; and
a control portion configured to control the output portion and the impedance matching circuit on the basis of the command data stored in the data storage portion, wherein,
the command data consists of a plurality of records,
each of the records includes power command data about a value of the high frequency power to be outputted and matching operation command data about whether to activate the impedance matching circuit, and
the control portion sends a power signal to the output portion and a synchronization signal to the impedance matching circuit, the power signal being generated on the basis of the power command data in the records, the synchronization signal being generated on the basis of the matching operation command data in the records.