CPC G03F 7/0045 (2013.01) [C07C 381/12 (2013.01); C07D 311/66 (2013.01); C07D 317/50 (2013.01); C07D 319/20 (2013.01); C07D 327/06 (2013.01); C07D 333/70 (2013.01); G03F 7/0382 (2013.01); G03F 7/0392 (2013.01)] | 9 Claims |
1. A resist composition which generates an acid upon exposure and exhibits changed solubility in a developing solution under action of acid, the resist composition comprising:
a base material component (A) exhibiting changed solubility in a developing solution under action of acid; and
a compound (D0) represented by General Formula (d0):
wherein R01, R02, R03 and R04 each independently represent a hydrogen atom, a hydroxy group, a halogen atom, or an alkyl group having 1 to 5 carbon atoms, alternatively, R01 and R02, R02 and R03, or R03 and R04 are bonded to each other to form an aromatic ring, the aromatic ring may have a substituent, R05 represents a hydrogen atom or an alkyl group having 1 to 5 carbon atoms, Y represents a group that forms an alicyclic group together with a carbon atom *C, the alicyclic group that is formed by Y may have a substituent, where at least one of carbon atoms that form the alicyclic group is substituted with an ether bond, a thioether bond, a carbonyl group, a sulfinyl group, or a sulfonyl group, and m represents an integer of 1 or more, where Mm+ represents an m-valent organic cation.
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