US 11,874,601 B2
Resist composition, method of forming resist pattern, compound, and acid diffusion-controlling agent
KhanhTin Nguyen, Kawasaki (JP)
Assigned to Tokyo Ohka Kogyo Co., Ltd., Kawasaki (JP)
Filed by TOKYO OHKA KOGYO CO., LTD., Kawasaki (JP)
Filed on Jun. 21, 2021, as Appl. No. 17/304,442.
Claims priority of application No. 2020-117327 (JP), filed on Jul. 7, 2020.
Prior Publication US 2022/0011665 A1, Jan. 13, 2022
Int. Cl. G03F 7/004 (2006.01); G03F 7/038 (2006.01); G03F 7/039 (2006.01); C07D 333/70 (2006.01); C07D 327/06 (2006.01); C07C 381/02 (2006.01); C07D 319/20 (2006.01); C07D 311/66 (2006.01); C07D 317/50 (2006.01); C07C 381/12 (2006.01)
CPC G03F 7/0045 (2013.01) [C07C 381/12 (2013.01); C07D 311/66 (2013.01); C07D 317/50 (2013.01); C07D 319/20 (2013.01); C07D 327/06 (2013.01); C07D 333/70 (2013.01); G03F 7/0382 (2013.01); G03F 7/0392 (2013.01)] 9 Claims
 
1. A resist composition which generates an acid upon exposure and exhibits changed solubility in a developing solution under action of acid, the resist composition comprising:
a base material component (A) exhibiting changed solubility in a developing solution under action of acid; and
a compound (D0) represented by General Formula (d0):

OG Complex Work Unit Chemistry
wherein R01, R02, R03 and R04 each independently represent a hydrogen atom, a hydroxy group, a halogen atom, or an alkyl group having 1 to 5 carbon atoms, alternatively, R01 and R02, R02 and R03, or R03 and R04 are bonded to each other to form an aromatic ring, the aromatic ring may have a substituent, R05 represents a hydrogen atom or an alkyl group having 1 to 5 carbon atoms, Y represents a group that forms an alicyclic group together with a carbon atom *C, the alicyclic group that is formed by Y may have a substituent, where at least one of carbon atoms that form the alicyclic group is substituted with an ether bond, a thioether bond, a carbonyl group, a sulfinyl group, or a sulfonyl group, and m represents an integer of 1 or more, where Mm+ represents an m-valent organic cation.