US 11,873,555 B2
Vaporizer, substrate processing apparatus and method of manufacturing semiconductor device
Gen Li, Toyama (JP); Hirohisa Yamazaki, Toyama (JP); and Kenichi Suzaki, Toyama (JP)
Assigned to Kokusai Electric Corporation, Tokyo (JP)
Filed by Kokusai Electric Corporation, Tokyo (JP)
Filed on Mar. 17, 2021, as Appl. No. 17/204,210.
Claims priority of application No. 2020-048652 (JP), filed on Mar. 19, 2020.
Prior Publication US 2021/0292895 A1, Sep. 23, 2021
Int. Cl. C23C 16/44 (2006.01); H01L 21/67 (2006.01)
CPC C23C 16/4405 (2013.01) [H01L 21/67017 (2013.01)] 15 Claims
OG exemplary drawing
 
1. A vaporizer comprising:
a liquid vessel in which a liquid source is stored;
a first heater immersed into the liquid source stored in the liquid vessel for heating the liquid source;
a second heater capable of heating the liquid vessel;
a first temperature sensor capable of measuring a temperature of the liquid source by immersion into the liquid source;
a second temperature sensor capable of measuring a temperature of the liquid vessel; and
a controller capable of controlling the first heater based on the temperature measured by the first temperature sensor and controlling the second heater based on the temperature measured by the second temperature sensor.