US 11,873,354 B2
Photobase generator, compound, photoreactive composition, and reaction product
Koji Arimitsu, Tokyo (JP)
Assigned to Tokyo University of Science Foundation, Tokyo (JP)
Appl. No. 17/641,574
Filed by Tokyo University of Science Foundation, Tokyo (JP)
PCT Filed Sep. 10, 2020, PCT No. PCT/JP2020/034262
§ 371(c)(1), (2) Date Mar. 9, 2022,
PCT Pub. No. WO2021/049563, PCT Pub. Date Mar. 18, 2021.
Claims priority of application No. 2019-164946 (JP), filed on Sep. 10, 2019.
Prior Publication US 2022/0298268 A1, Sep. 22, 2022
Int. Cl. C08F 2/50 (2006.01); C08F 122/10 (2006.01); C07C 59/11 (2006.01); C07C 69/732 (2006.01); C07C 279/04 (2006.01); C07C 279/22 (2006.01); C07D 233/06 (2006.01); C07D 295/185 (2006.01); C07D 311/86 (2006.01); C08G 59/50 (2006.01)
CPC C08F 2/50 (2013.01) [C07C 59/11 (2013.01); C07C 69/732 (2013.01); C07C 279/04 (2013.01); C07C 279/22 (2013.01); C07D 233/06 (2013.01); C07D 295/185 (2013.01); C07D 311/86 (2013.01); C08F 122/1006 (2020.02); C08G 59/5046 (2013.01)] 9 Claims
 
1. A photobase generator, comprising a compound including a first skeleton represented by the following formula (a), and a second skeleton including a nitrogen atom bonding to a bonding position of the first skeleton to form an amide group,
wherein the compound generates a base, in which a hydrogen atom is bonding with the nitrogen atom of the second skeleton, by light irradiation, and a pKa of a conjugate acid of the base in water is 12 or more:

OG Complex Work Unit Chemistry
wherein, in formula (a), G is a divalent aromatic group, and * represents the bonding position with the nitrogen atom.