CPC C08F 2/50 (2013.01) [C07C 59/11 (2013.01); C07C 69/732 (2013.01); C07C 279/04 (2013.01); C07C 279/22 (2013.01); C07D 233/06 (2013.01); C07D 295/185 (2013.01); C07D 311/86 (2013.01); C08F 122/1006 (2020.02); C08G 59/5046 (2013.01)] | 9 Claims |
1. A photobase generator, comprising a compound including a first skeleton represented by the following formula (a), and a second skeleton including a nitrogen atom bonding to a bonding position of the first skeleton to form an amide group,
wherein the compound generates a base, in which a hydrogen atom is bonding with the nitrogen atom of the second skeleton, by light irradiation, and a pKa of a conjugate acid of the base in water is 12 or more:
wherein, in formula (a), G is a divalent aromatic group, and * represents the bonding position with the nitrogen atom.
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