US 11,873,183 B2
Medium placement device and recording system
Shun Ito, Matsumoto (JP); Masaki Namiki, Kitakyushu (JP); Haruna Takahashi, Ina (JP); and Mio Yashita, Shiojiri (JP)
Assigned to Seiko Epson Corporation, Tokyo (JP)
Filed by Seiko Epson Corporation, Tokyo (JP)
Filed on Oct. 19, 2021, as Appl. No. 17/505,140.
Claims priority of application No. 2020-177402 (JP), filed on Oct. 22, 2020.
Prior Publication US 2022/0127098 A1, Apr. 28, 2022
Int. Cl. B65H 31/24 (2006.01); B41J 15/20 (2006.01); B65H 29/40 (2006.01); B65H 31/26 (2006.01); B65H 35/00 (2006.01)
CPC B65H 31/24 (2013.01) [B41J 15/20 (2013.01); B65H 29/40 (2013.01); B65H 31/26 (2013.01); B65H 35/0006 (2013.01); B65H 2401/22 (2013.01); B65H 2403/51 (2013.01); B65H 2404/721 (2013.01); B65H 2405/1117 (2013.01); B65H 2405/332 (2013.01)] 8 Claims
OG exemplary drawing
 
1. A medium placement device configured to have, thereon, a first medium to be discharged from an opening portion of a processing device, a second medium to be supplied to the opening portion of the processing device and then discharged from the opening portion of the processing device, the medium placement device comprising:
a placement unit configured to have the first medium thereon at a position lower than the opening portion of the processing device,
a cover member configured to cover the placement unit and have the second medium thereon,
a mover configured to move the cover member between a first position and a second position that is lower than the first position, wherein
the cover member is configured such that
when the cover member is moved to the first position by the mover, a first surface of the cover member which is a surface facing the placement unit is at a position higher than the opening portion of the processing device, and the first medium discharged from the opening portion of the processing device is configured to be guided by the first surface to be placed on the placement unit, and
when the cover member is moved to the second position by the mover, a second surface that is opposite to the first surface is at the same position as or at a position lower than the opening portion of the processing device, and the second medium placed on the second surface is supplied to the opening portion and then discharged to the placement unit from the opening portion of the processing device.