US 11,871,644 B2
Mask, mask assembly, and apparatus for manufacturing display apparatus
Daewon Baek, Yongin-si (KR); Minji Jang, Yongin-si (KR); and Jongbum Kim, Yongin-si (KR)
Assigned to Samsung Display Co., Ltd., Yongin-si (KR)
Filed by Samsung Display Co., Ltd., Yongin-si (KR)
Filed on Apr. 27, 2022, as Appl. No. 17/661,031.
Claims priority of application No. 10-2021-0066828 (KR), filed on May 25, 2021.
Prior Publication US 2022/0384769 A1, Dec. 1, 2022
Int. Cl. C23C 14/04 (2006.01); B05C 21/00 (2006.01); H10K 71/00 (2023.01)
CPC H10K 71/00 (2023.02) [B05C 21/005 (2013.01); C23C 14/042 (2013.01)] 6 Claims
OG exemplary drawing
 
1. A mask comprising:
a plurality of deposition pattern portions arranged along a first direction and each including a plurality of deposition holes that are configured to have deposition material pass therethrough; and
a dummy pattern portion outside and between the deposition pattern portions,
wherein the dummy pattern portion includes an auxetic structure having a negative Poisson's ratio such that the dummy pattern portion is configured to stretch in a direction perpendicular to the first direction in response to a tensile force applied in the first direction,
wherein the deposition pattern portions include a first deposition hole and a second deposition hole having different planar shapes from each other, and the second deposition hole is adjacent to one of the plurality of dummy holes of the dummy pattern portion in the first direction, and
wherein the second deposition hole has a shape corresponding to a shape of one of the plurality of dummy holes such that a width between the second deposition hole and the one of the plurality of dummy holes is constant in a plan view.