| CPC H10K 59/131 (2023.02) [H10K 59/1213 (2023.02); H10K 59/1216 (2023.02)] | 6 Claims |
|
1. A method of manufacturing a display device, comprising:
forming a semiconductor layer on a substrate;
forming a first conductive line on the semiconductor layer; and
forming a second conductive line on the first conductive line, the second conductive line including a first layer including aluminum or an aluminum alloy, a second layer including a refractory metal nitride, and a third layer including a refractory metal,
wherein the third layer of the second conductive line has a multilayer structure including a plurality of stacked sub-layers, and
wherein the forming the second conductive line includes a vacuum break between forming the sub-layers.
|