CPC C23C 16/45544 (2013.01) [C23C 16/458 (2013.01); C23C 16/45536 (2013.01); H01J 37/3244 (2013.01); H01J 37/32082 (2013.01); H01J 37/32211 (2013.01); H01L 21/673 (2013.01); H01L 21/67017 (2013.01); H01L 21/67103 (2013.01); H01L 21/6875 (2013.01); H01L 21/68735 (2013.01)] | 20 Claims |
1. A substrate processing device having a substrate supporting unit configured to accommodate a substrate, the substrate supporting unit comprising:
a base;
a first protrusion protruding from the base to a first height, the first protrusion defining, in part, a recess within the substrate supporting unit; and
a second protrusion within the recess and protruding from the base to a second height less than the first height,
wherein the first protrusion comprises a contact surface to receive an edge of a substrate and a sealing surface configured to contact a reactor wall,
wherein the contact surface defines a top of the recess,
wherein the substrate is received above the recess,
wherein a height of the contact surface is greater than the second height, and
wherein the first protrusion surrounds the second protrusion.
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