US 11,866,823 B2
Substrate supporting unit and a substrate processing device including the same
SeungHwan Lee, Anseong-si (KR); HakYong Kwon, Hwaseong-si (KR); JongSu Kim, Hwaseong-si (KR); SungBae Kim, Cheonan-si (KR); and JuHyuk Park, Asan-si (KR)
Assigned to ASM IP Holding B.V., Almere (NL)
Filed by ASM IP Holding B.V., Almere (NL)
Filed on Oct. 17, 2022, as Appl. No. 17/967,035.
Application 17/967,035 is a continuation of application No. 16/671,847, filed on Nov. 1, 2019, granted, now 11,499,226.
Claims priority of application No. 10-2018-0133838 (KR), filed on Nov. 2, 2018.
Prior Publication US 2023/0052239 A1, Feb. 16, 2023
Int. Cl. C23C 16/455 (2006.01); H01J 37/32 (2006.01); H01L 21/67 (2006.01); H01L 21/673 (2006.01); C23C 16/458 (2006.01); H01L 21/687 (2006.01)
CPC C23C 16/45544 (2013.01) [C23C 16/458 (2013.01); C23C 16/45536 (2013.01); H01J 37/3244 (2013.01); H01J 37/32082 (2013.01); H01J 37/32211 (2013.01); H01L 21/673 (2013.01); H01L 21/67017 (2013.01); H01L 21/67103 (2013.01); H01L 21/6875 (2013.01); H01L 21/68735 (2013.01)] 20 Claims
OG exemplary drawing
 
1. A substrate processing device having a substrate supporting unit configured to accommodate a substrate, the substrate supporting unit comprising:
a base;
a first protrusion protruding from the base to a first height, the first protrusion defining, in part, a recess within the substrate supporting unit; and
a second protrusion within the recess and protruding from the base to a second height less than the first height,
wherein the first protrusion comprises a contact surface to receive an edge of a substrate and a sealing surface configured to contact a reactor wall,
wherein the contact surface defines a top of the recess,
wherein the substrate is received above the recess,
wherein a height of the contact surface is greater than the second height, and
wherein the first protrusion surrounds the second protrusion.