US 11,866,822 B2
Vaporizer, substrate processing apparatus, and method of manufacturing semiconductor device
Hirohisa Yamazaki, Toyama (JP); Ryuichi Nakagawa, Toyama (JP); Kenichi Suzaki, Toyama (JP); and Yasunori Ejiri, Toyama (JP)
Assigned to KOKUSAI ELECTRIC CORPORATION, Tokyo (JP)
Filed by KOKUSAI ELECTRIC CORPORATION, Tokyo (JP)
Filed on Sep. 16, 2020, as Appl. No. 17/022,755.
Claims priority of application No. 2019-169405 (JP), filed on Sep. 18, 2019.
Prior Publication US 2021/0079523 A1, Mar. 18, 2021
Int. Cl. C23C 16/44 (2006.01); H01L 21/02 (2006.01); C23C 16/40 (2006.01); C23C 16/448 (2006.01)
CPC C23C 16/4405 (2013.01) [C23C 16/403 (2013.01); C23C 16/4485 (2013.01); H01L 21/02178 (2013.01); H01L 21/02271 (2013.01)] 14 Claims
OG exemplary drawing
 
1. A vaporizer comprising:
a precursor vessel in which a liquid precursor is stored;
a first heater immersed in the liquid precursor stored in the precursor vessel and configured to heat the liquid precursor;
a second heater configured to heat the precursor vessel;
a first temperature sensor immersed in the liquid precursor stored in the precursor vessel and configured to measure a temperature of the liquid precursor;
a second temperature sensor immersed in the liquid precursor stored in the precursor vessel and configured to measure a temperature of the liquid precursor;
a liquid surface detection sensor configured to detect a height of a liquid surface of the liquid precursor in the precursor vessel; and
a controller configured to be capable of:
controlling the first heater based on the temperature measured by the first temperature sensor;
controlling the second heater based on the temperature measured by the second temperature sensor; and
stopping heating by the first heater and the second heater, when a position of the liquid surface detected by the liquid surface detection sensor is lower than a predetermined liquid surface range set above the first temperature sensor.