US 11,866,601 B2
Ink set and printing method
Yuta Asakawa, Azumino (JP); Mitsuaki Kosaka, Minowa (JP); Akira Mizutani, Matsumoto (JP); and Akiko Matsuzaki, Matsumoto (JP)
Assigned to SEIKO EPSON CORPORATION
Filed by Seiko Epson Corporation, Tokyo (JP)
Filed on Aug. 24, 2021, as Appl. No. 17/409,926.
Claims priority of application No. 2020-141529 (JP), filed on Aug. 25, 2020.
Prior Publication US 2022/0064472 A1, Mar. 3, 2022
Int. Cl. C09D 11/54 (2014.01); C09D 11/107 (2014.01); B41M 5/00 (2006.01); C09D 11/38 (2014.01); C09D 11/40 (2014.01); C09D 11/033 (2014.01); B41J 2/21 (2006.01)
CPC C09D 11/54 (2013.01) [B41J 2/2107 (2013.01); B41J 2/2114 (2013.01); B41M 5/0023 (2013.01); C09D 11/033 (2013.01); C09D 11/107 (2013.01); C09D 11/38 (2013.01); C09D 11/40 (2013.01)] 14 Claims
OG exemplary drawing
 
1. An ink set comprising:
an ink composition; and
a treatment liquid composition,
wherein
each of the ink composition and the treatment liquid composition is used for printing by being applied onto a printing medium by an ink jet method,
the ink composition is a water-based composition containing a coloring material and a surfactant,
the treatment liquid composition is a water-based composition containing a flocculant and a surfactant,
each of the surfactant contained in the ink composition and the surfactant contained in the treatment liquid composition includes a silicone surfactant whose 0.1 mass % aqueous solution has a surface tension of 32 mN/m or less,
any one of the surfactant contained in the ink composition and the surfactant contained in the treatment liquid composition includes a silicone surfactant whose 0.1 mass % solution in a nitrogen-containing solvent has a surface tension of 32 mN/m or less,
any one of the ink composition and the treatment liquid composition contains any one of a nitrogen-containing solvent, a sulfur-containing solvent, and a cyclic ester, and
any one of the ink composition and the treatment liquid composition contains a nitrogen-containing solvent represented by any one of following formulas (1), (3) and (4):

OG Complex Work Unit Chemistry
wherein R1 and R2 each independently represent one selected from the group consisting of a hydrogen atom and alkyl groups with 1 to 5 carbon atoms, and R3 represents an alkyl group with 1 to 5 carbon atoms;

OG Complex Work Unit Chemistry
wherein R1 and R2 each independently represent one selected from the group consisting of a hydrogen atom and alkyl groups with 1 to 5 carbon atoms, and R3 represents an alkyl group with 1 to 5 carbon atoms;

OG Complex Work Unit Chemistry
wherein R1 represents one selected from the group consisting of a hydrogen atom and an alkyl or alkenyl group with 1 to 6 carbon atoms, and R2 represents an alkylene group with 1 to 6 carbon atoms that is a part of a cyclic amide ring.