US 10,892,594 B2
Gas optimization in a gas discharge light source
Tanuj Aggarwal, San Jose, CA (US)
Assigned to Cymer, LLC, San Diego, CA (US)
Filed by Cymer, LLC, San Diego, CA (US)
Filed on Dec. 26, 2018, as Appl. No. 16/232,321.
Application 16/232,321 is a continuation of application No. 15/457,600, filed on Mar. 13, 2017, granted, now 10,218,147.
Application 15/457,600 is a continuation of application No. 15/044,677, filed on Feb. 16, 2016, granted, now 9,634,455, issued on Apr. 25, 2017.
Prior Publication US 2019/0190229 A1, Jun. 20, 2019
This patent is subject to a terminal disclaimer.
Int. Cl. H01S 3/134 (2006.01); H01S 3/036 (2006.01); H01S 3/225 (2006.01); H01S 3/104 (2006.01); H01S 3/038 (2006.01); H01S 3/097 (2006.01); H01S 3/13 (2006.01); H01S 3/23 (2006.01); H01S 3/08 (2006.01); H01S 3/0971 (2006.01)
CPC H01S 3/134 (2013.01) [H01S 3/036 (2013.01); H01S 3/0385 (2013.01); H01S 3/09705 (2013.01); H01S 3/104 (2013.01); H01S 3/1305 (2013.01); H01S 3/225 (2013.01); H01S 3/08009 (2013.01); H01S 3/08036 (2013.01); H01S 3/0971 (2013.01); H01S 3/2308 (2013.01); H01S 3/2366 (2013.01)] 25 Claims
OG exemplary drawing
 
1. A method comprising:
performing a first full replenishment of a first gas mixture in a first gas discharge chamber of a first stage of a light source, the first full replenishment comprising replacing the first gas mixture in the first gas discharge chamber;
performing a second full replenishment of a second gas mixture in a second gas discharge chamber of a second stage of the light source, the second full replenishment comprising replacing the second gas mixture in the second gas discharge chamber;
after the first and second full replenishments are completed, performing a first gas adjustment procedure on the first gas discharge chamber, the first gas adjustment procedure comprising adjusting one or more operating characteristics of the first gas discharge chamber based on one or more operating parameters of the first gas discharge chamber;
determining that the one or more operating characteristics of the first gas discharge chamber no longer should be adjusted;
after the first gas adjustment procedure is completed and after it has been determined that the one or more operating characteristics of the first gas discharge chamber no longer should be adjusted, feeding a pulsed amplified light beam output from the first stage to the second stage and performing a second gas adjustment procedure on the second gas discharge chamber, the second gas adjustment procedure on the second gas discharge chamber comprising adjusting one or more operating characteristics of the second gas discharge chamber based on one or more operating parameters of the second gas discharge chamber; and
after completion of the first and second gas adjustment procedures, operating the light source under normal operating conditions.