US 10,892,172 B2
Removal of process effluents
Rubinder S. Randhawa, Dublin, CA (US); and Harry Christov, Campbell, CA (US)
Assigned to Planar Semiconductor, Inc., Milpitas, CA (US)
Appl. No. 16/478,407
Filed by Planar Semiconductor, Inc., Milpitas, CA (US)
PCT Filed Feb. 6, 2018, PCT No. PCT/US2018/017014
§ 371(c)(1), (2) Date Jul. 16, 2019,
PCT Pub. No. WO2018/145070, PCT Pub. Date Aug. 9, 2018.
Claims priority of provisional application 62/518,297, filed on Jun. 12, 2017.
Claims priority of provisional application 62/455,425, filed on Feb. 6, 2017.
Prior Publication US 2019/0378729 A1, Dec. 12, 2019
Int. Cl. H01L 21/67 (2006.01); B08B 3/02 (2006.01); H01L 21/02 (2006.01); H01L 21/687 (2006.01)
CPC H01L 21/67034 (2013.01) [B08B 3/022 (2013.01); H01L 21/02057 (2013.01); H01L 21/67051 (2013.01); B08B 2203/002 (2013.01); B08B 2203/027 (2013.01); B08B 2203/0264 (2013.01); H01L 21/68728 (2013.01)] 37 Claims
OG exemplary drawing
 
1. A substrate cleaning and drying apparatus, the apparatus comprising:
a vertical substrate holder configured to hold and rotate the substrate vertically at various speeds;
an inner shield and an outer shield configured to at least partially surround the vertical substrate holder during operation of the apparatus, each of the inner shield and the outer shield being configured to rotate vertically and independently from each other in at least one of rotational speed and direction from the other shield;
a front-side spray jet array and a back-side spray jet array, each of the front-side spray jet array and the back-side spray jet array being configured to spray at least one fluid onto both sides of the substrate and edges of the substrate substantially concurrently; and
at least one substantially-planar turbine disk coupled vertically and in proximity to at least one of the inner shield and the outer shield and configured to remove an excess amount of the at least one fluid, the at least one turbine disk having a plurality of spaced-apart fins, each of the fins being separated from adjacent fins by an opening formed within and near a periphery of the turbine disk, the fins being arranged to evacuate the at least one fluid and other process effluents away from both the substrate and a volume between the inner shield and the outer shield surrounding the substrate.