US 10,892,141 B2
Nanosecond pulser pulse generation
Timothy Ziemba, Bainbridge Island, WA (US); Ilia Slobodov, Seattle, WA (US); John Carscadden, Seattle, WA (US); Kenneth Miller, Seattle, WA (US); and Morgan Quinley, Seattle, WA (US)
Assigned to Eagle Harbor Technologies, Inc., Seattle, WA (US)
Filed by Eagle Harbor Technologies, Inc., Seattle, WA (US)
Filed on Jul. 29, 2019, as Appl. No. 16/524,950.
Application 16/524,950 is a continuation in part of application No. 16/523,840, filed on Jul. 26, 2019.
Claims priority of provisional application 62/789,526, filed on Jan. 8, 2019.
Claims priority of provisional application 62/789,523, filed on Jan. 8, 2019.
Claims priority of provisional application 62/717,523, filed on Aug. 10, 2018.
Claims priority of provisional application 62/711,468, filed on Jul. 27, 2018.
Claims priority of provisional application 62/711,467, filed on Jul. 27, 2018.
Claims priority of provisional application 62/711,347, filed on Jul. 27, 2018.
Claims priority of provisional application 62/711,457, filed on Jul. 27, 2018.
Claims priority of provisional application 62/711,334, filed on Jul. 27, 2018.
Claims priority of provisional application 62/711,464, filed on Jul. 27, 2018.
Claims priority of provisional application 62/711,406, filed on Jul. 27, 2018.
Prior Publication US 2020/0035458 A1, Jan. 30, 2020
Int. Cl. H01J 37/32 (2006.01); H01L 21/683 (2006.01); H01L 21/687 (2006.01); H02M 3/335 (2006.01); H03K 3/57 (2006.01); H05K 7/20 (2006.01); H03M 1/12 (2006.01)
CPC H01J 37/32146 (2013.01) [H01J 37/32082 (2013.01); H01J 37/32091 (2013.01); H01J 37/32128 (2013.01); H01J 37/32174 (2013.01); H01J 37/32541 (2013.01); H01J 37/32568 (2013.01); H01J 37/32715 (2013.01); H01L 21/6833 (2013.01); H01L 21/68757 (2013.01); H02M 3/33523 (2013.01); H03K 3/57 (2013.01); H03M 1/12 (2013.01); H05K 7/20154 (2013.01); H05K 7/20172 (2013.01); H05K 7/20254 (2013.01); H05K 7/20272 (2013.01); H05K 7/20281 (2013.01); H05K 7/20509 (2013.01)] 22 Claims
OG exemplary drawing
 
1. A high voltage pulsing power supply comprising:
a high voltage pulser having an output that provides pulses with an amplitude greater than about 1 kV, a pulse width less than about 1 μs, and a pulse repetition frequency greater than about 20 kHz;
a plasma chamber;
an electrode disposed within the plasma chamber that is electrically coupled with the output of the high voltage pulser to produce an electric field within the plasma chamber;
an enclosure having a volumetric dimension of less than 1 m3, wherein the high voltage pulser is disposed within the enclosure; and
at least three of the following a thermal management system, a control system, a bias capacitor, a bias compensation power supply, a second high voltage pulser, a resistive output stage, and an energy recovery circuit being disposed within the enclosure.