US 10,892,138 B2
Multi-beam inspection apparatus with improved detection performance of signal electrons
Weiming Ren, San Jose, CA (US); Xuedong Liu, San Jose, CA (US); Xuerang Hu, San Jose, CA (US); and Zhong-wei Chen, San Jose, CA (US)
Assigned to ASML Netherlands B.V., Veldhoven (NL)
Filed by ASML Netherlands B.V., Veldhoven (NL)
Filed on Mar. 7, 2019, as Appl. No. 16/295,971.
Claims priority of provisional application 62/641,204, filed on Mar. 9, 2018.
Prior Publication US 2019/0279844 A1, Sep. 12, 2019
Int. Cl. H01J 37/317 (2006.01); H01J 37/147 (2006.01); H01J 37/30 (2006.01); B82Y 40/00 (2011.01); B82Y 10/00 (2011.01); H01J 37/28 (2006.01)
CPC H01J 37/3177 (2013.01) [B82Y 10/00 (2013.01); B82Y 40/00 (2013.01); H01J 37/1471 (2013.01); H01J 37/1472 (2013.01); H01J 37/28 (2013.01); H01J 37/3007 (2013.01); H01J 2237/1501 (2013.01); H01J 2237/151 (2013.01); H01J 2237/1508 (2013.01); H01J 2237/2446 (2013.01); H01J 2237/2448 (2013.01); H01J 2237/24475 (2013.01); H01J 2237/2804 (2013.01); H01J 2237/2817 (2013.01)] 15 Claims
OG exemplary drawing
 
1. A crossover-forming deflector array of an electro-optical system for directing a plurality of electron beams onto an electron detection device, the crossover-forming deflector array comprising:
a plurality of crossover-forming deflectors positioned at or at least near an image plane of a set of one or more electro-optical lenses of the electro-optical system, wherein each crossover-forming deflector is aligned with a corresponding electron beam of the plurality of electron beams.