US 10,892,136 B2
Ion source thermal gas bushing
Craig R. Chaney, Gloucester, MA (US); and Adam M. McLaughlin, Merrimac, MA (US)
Assigned to Varian Semiconductor Equipment Associates, Inc., Gloucester, MA (US)
Filed by Varian Semiconductor Equipment Associates, Inc., Gloucester, MA (US)
Filed on Aug. 13, 2018, as Appl. No. 16/101,822.
Prior Publication US 2020/0051773 A1, Feb. 13, 2020
Int. Cl. H01J 37/08 (2006.01); H01J 27/02 (2006.01)
CPC H01J 37/08 (2013.01) [H01J 27/022 (2013.01)] 18 Claims
OG exemplary drawing
 
1. A system for delivering feed gas to an ion source, comprising:
a gas tube, having an inner channel in fluid communication with a dopant source; and
a gas bushing, having an inner channel in fluid communication with the inner channel of the gas tube and an ion source chamber, wherein the gas bushing has a thermal conductivity of less than 30 W/m K so as to thermally separate the gas tube from the ion source chamber.