US 10,889,890 B2
Vacuum processing apparatus and method for vacuum processing substrates
Silvia Schwyn-Thony, Wangs (CH); Romeo Good, Walenstadt (CH); Michael Cheseaux, Klosters (CH); and Marco Padrun, Maienfeld (CH)
Assigned to EVATEC AG, Trübbach (CH)
Appl. No. 15/758,459
Filed by Evatec AG, Trubbach (CH)
PCT Filed Sep. 5, 2016, PCT No. PCT/EP2016/070846
§ 371(c)(1), (2) Date Mar. 8, 2018,
PCT Pub. No. WO2017/042123, PCT Pub. Date Mar. 16, 2017.
Claims priority of provisional application 62/215,238, filed on Sep. 8, 2015.
Prior Publication US 2018/0245212 A1, Aug. 30, 2018
Int. Cl. C23C 14/35 (2006.01); C23C 14/50 (2006.01); H01J 37/34 (2006.01); H01J 37/32 (2006.01)
CPC C23C 14/35 (2013.01) [C23C 14/505 (2013.01); H01J 37/32715 (2013.01); H01J 37/32779 (2013.01); H01J 37/3408 (2013.01); H01J 37/3423 (2013.01); H01J 37/3452 (2013.01)] 9 Claims
OG exemplary drawing
1. A vacuum treatment apparatus comprising
a vacuum treatment recipient with at least one sealable, circular opening between an inside and exterior of said recipient, said recipient housing a turntable, which
defines a first plane along a table surface of the turntable;
is drivingly rotatable around a central axis of the turntable perpendicular to the first plane
and exhibits a plurality of circular substrate supports;
said at least one opening being arranged such that during a turn of the turntable the area of each of the substrate supports and the opening are fully aligned and completely face each other;
a PVD deposition source attached to said at least one opening
said PVD source exhibiting at least a circular material target and a static magnet arrangement, said magnet arrangement
being arranged in a second plane in parallel to the first plane;
not being rotational symmetric around a central axis of the magnetic arrangement running centrally through said magnet arrangement and being perpendicular to said second plane;
being asymmetric around any symmetry axis in the second plane; and
comprising two closed loops of magnets with identical polarity per loop and opposite polarity between both loops, one loop surrounding the other, forming an outer loop and an inner loop, wherein the outer loop is surrounding the central axis of the magnetic arrangement and both loops of magnets are asymmetric around any symmetry axis in the second plane.