US 10,889,675 B2
Rheology modifiers for encapsulating quantum dots
Zhifeng Bai, Midland, MI (US); Jake Joo, Somerville, MA (US); James C. Taylor, Grafton, MA (US); Liang Chen, Midland, MI (US); Valeriy V. Ginzburg, Midland, MI (US); Jessica Ye Huang, Midland, MI (US); and Christopher J. Tucker, Midland, MI (US)
Assigned to Rohm and Haas Electronic Materials LLC, Marlborough, MA (US); and Dow Global Technologies LLC, Midland, MI (US)
Appl. No. 16/78,878
Filed by Dow Global Technologies LLC, Midland, MI (US); and Rohm and Haas Electronic Materials LLC, Marlborough, MA (US)
PCT Filed May 12, 2017, PCT No. PCT/US2017/032311
§ 371(c)(1), (2) Date Aug. 22, 2018,
PCT Pub. No. WO2017/205079, PCT Pub. Date Nov. 30, 2017.
Claims priority of provisional application 62/342,280, filed on May 27, 2016.
Prior Publication US 2019/0085112 A1, Mar. 21, 2019
Int. Cl. B82Y 20/00 (2011.01); B82Y 40/00 (2011.01); C08F 287/00 (2006.01); C08F 292/00 (2006.01); C09K 11/02 (2006.01); C08K 5/10 (2006.01); C08K 3/08 (2006.01); B82Y 30/00 (2011.01)
CPC C08F 287/00 (2013.01) [B82Y 20/00 (2013.01); C08F 292/00 (2013.01); C08K 3/08 (2013.01); C08K 5/10 (2013.01); C09K 11/02 (2013.01); B82Y 30/00 (2013.01); B82Y 40/00 (2013.01); C08K 2201/001 (2013.01)] 10 Claims
 
1. A polymer resin comprising:
(a) quantum dots,
(b) a compound of formula (I)

OG Complex Work Unit Drawing
wherein R1 is hydrogen or methyl and R2 is a C6-C20 aliphatic polycyclic substituent, and
(c) a block or graft copolymer having Mn from 50,000 to 400,000 and comprising from 10 to 100 wt % polymerized units of styrene and from 0 to 90 wt % of a non-styrene block; wherein the non-styrene block has a van Krevelen solubility parameter from 15.0 to 17.5 (J/cm3)1/2.