US 10,889,493 B2
MEMS method and structure
Ting-Hau Wu, Yilan (TW); and Kuei-Sung Chang, Kaohsiung (TW)
Assigned to Taiwan Semiconductor Manufacturing Company, Ltd., Hsin-Chu (TW)
Filed by Taiwan Semiconductor Manufacturing Company, Ltd., Hsinchu (TW)
Filed on Dec. 20, 2018, as Appl. No. 16/228,286.
Application 15/212,827 is a division of application No. 13/827,928, filed on Mar. 14, 2013, granted, now 9,394,164, issued on Jul. 19, 2016.
Application 16/228,286 is a continuation of application No. 15/212,827, filed on Jul. 18, 2016, granted, now 10,160,642.
Claims priority of provisional application 61/778,135, filed on Mar. 12, 2013.
Prior Publication US 2019/0119105 A1, Apr. 25, 2019
Int. Cl. B81C 1/00 (2006.01); B81B 3/00 (2006.01)
CPC B81C 1/00801 (2013.01) [B81B 3/0021 (2013.01); B81C 1/00587 (2013.01); B81B 2201/0235 (2013.01); B81B 2207/012 (2013.01); B81B 2207/015 (2013.01); B81C 2201/0132 (2013.01); B81C 2201/0133 (2013.01); B81C 2203/036 (2013.01)] 20 Claims
OG exemplary drawing
 
1. A method of manufacturing a microelectromechanical structure, the method comprising:
forming a support film on a first surface of a first substrate, the first substrate comprising two support regions and a movable mass region between the two support regions, the support film covering first areas of the first surface of the first substrate and exposing second areas of the first surface of the first substrate;
after forming the support film, bonding the second areas of the first surface of the first substrate to a second substrate; and
after the bonding, separating the movable mass region from the two support regions by removing portions of the first substrate between the two support regions and the movable mass region, wherein separating the movable mass region separates the support film into a first segment attached to the movable mass region and second segments attached to the two support regions, wherein the first segment of the support film has a first side facing the second substrate and has a second side facing away from the second substrate, the second side being fully covered by the movable mass region.