US 10,889,052 B2
Imprint apparatus, method for manufacturing article, and exposure apparatus
Masami Yonekawa, Utsunomiya (JP); and Yoichi Matsuoka, Shioya-gun (JP)
Assigned to CANON KABUSHIKI KAISHA, Tokyo (JP)
Filed by CANON KABUSHIKI KAISHA, Tokyo (JP)
Filed on Feb. 17, 2017, as Appl. No. 15/436,635.
Claims priority of application No. 2016-038129 (JP), filed on Feb. 29, 2016.
Prior Publication US 2017/0246792 A1, Aug. 31, 2017
Int. Cl. B29C 59/00 (2006.01); B29C 59/02 (2006.01); H01L 21/027 (2006.01); G03F 7/00 (2006.01); B29L 31/34 (2006.01)
CPC B29C 59/002 (2013.01) [B29C 59/022 (2013.01); B29C 59/026 (2013.01); G03F 7/0002 (2013.01); H01L 21/0271 (2013.01); B29L 2031/3406 (2013.01)] 11 Claims
OG exemplary drawing
 
1. An imprint apparatus for forming a pattern of an imprint material on a substrate by using a mold, the imprint apparatus comprising:
a voltage source;
a mold holding unit configured to hold the mold;
a substrate holding unit configured to hold the substrate; and
a plate member provided on at least either one surface of a peripheral region of a region covered by the mold of the mold holding unit and a peripheral region of a region covered by the substrate of the substrate holding unit,
wherein a first electrode and a second electrode are provided on a surface of the plate member,
wherein each of the first electrode and the second electrode is applied with electric potential having different polarity with each other so that an electric field is formed between the first electrode and the second electrode, and
wherein the voltage source applies a positive potential with respect to the ground potential to the first electrode, and applies a negative potential with respect to the ground to the second electrode.