US D1,057,147 S
Mask
Jae Won Shin, Seoul (KR)
Filed by Jae Won Shin, Seoul (KR)
Filed on Feb. 13, 2023, as Appl. No. 29/884,513.
Claims priority of application No. 30-2023-0004253 (KR), filed on Feb. 6, 2023.
Term of patent 15 Years
LOC (15) Cl. 29 - 02
U.S. Cl. D24—110.1  [D29/108; D2/600]
OG exemplary drawing
 
The ornamental design for a mask, as shown and described.