CPC H01S 3/0057 (2013.01) [G01N 21/4788 (2013.01); G02F 1/354 (2021.01); G03F 7/70025 (2013.01); G03F 7/70041 (2013.01); G03F 7/7065 (2013.01); H01S 3/0092 (2013.01); G01N 2201/06113 (2013.01); H01S 3/1618 (2013.01); H01S 3/1625 (2013.01); H01S 3/1636 (2013.01); H01S 3/1643 (2013.01)] | 22 Claims |
1. An extreme-ultraviolet (EUV) radiation light source generation apparatus, comprising:
a pump laser, configured to provide a pulse laser radiation beam;
at least one pulse shaping unit, wherein each one of the at least one pulse shaping unit is configured to conduct a spectrum extending operation and a phase compensation operation to the pulse laser radiation beam, and the phase compensation operation is configured to make a plurality of frequency components of the pulse laser radiation beam emitted by the pulse shaping unit to be substantially in phase;
a wavelength conversion unit, configured to conduct a center wavelength conversion operation to the pulse laser radiation beam; and
a high-order harmonics generation unit, configured to receive the pulse laser radiation beam processed by the at least one pulse shaping unit and the center wavelength conversion operation, and configured to focus the received pulse laser radiation beam to a high order harmonic generation medium to generate a high order harmonic radiation beam.
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