US 12,191,323 B2
Display device manufacturing apparatus and method
Kihwan Seok, Yongin-si (KR); and Hoonchul Ryoo, Yongin-si (KR)
Assigned to SAMSUNG DISPLAY CO., LTD., Yongin-si (KR)
Filed by Samsung Display Co., Ltd., Yongin-si (KR)
Filed on Mar. 18, 2021, as Appl. No. 17/205,509.
Claims priority of application No. 10-2020-0102715 (KR), filed on Aug. 14, 2020.
Prior Publication US 2022/0052082 A1, Feb. 17, 2022
Int. Cl. H01L 27/12 (2006.01)
CPC H01L 27/1285 (2013.01) [H01L 27/1262 (2013.01); H01L 27/1296 (2013.01)] 14 Claims
OG exemplary drawing
 
1. A display device manufacturing method comprising:
annealing a display substrate by irradiating a laser to the display substrate in different energy values;
measuring a transmittance of the annealed display substrate; and
determining an optimal crystallization value of the display substrate based on the transmittance,
wherein the annealing of the display substrate comprises:
dividing the display substrate into a plurality of areas; and
irradiating the laser having different energy values corresponding to the plurality of areas, respectively, of the display substrate,
wherein the determining of the optimal crystallization value comprises:
calculating an absorbance of the annealed display substrate for each energy value of the laser based on the transmittance;
calculating a band gap energy of the annealed display substrate for each energy value of the laser based on the absorbance; and
determining an energy value of the laser corresponding to a minimum value of the band gap energy as the optimal crystallization value.