US 12,189,314 B2
Metrology method and associated metrology and lithographic apparatuses
Sebastianus Adrianus Goorden, Eindhoven (NL); Simon Gijsbert Josephus Mathijssen, Rosmalen (NL); Leendert Jan Karssemeijer, Hertogenbosch (NL); Manouk Rijpstra, Eindhoven (NL); Ralph Brinkhof, Vught (NL); and Kaustuve Bhattacharyya, Veldhoven (NL)
Assigned to ASML NETHERLANDS B.V., Veldhoven (NL)
Appl. No. 18/035,008
Filed by ASML NETHERLANDS B.V., Veldhoven (NL)
PCT Filed Nov. 4, 2021, PCT No. PCT/EP2021/080602
§ 371(c)(1), (2) Date May 2, 2023,
PCT Pub. No. WO2022/111967, PCT Pub. Date Jun. 2, 2022.
Claims priority of application No. 20210371 (EP), filed on Nov. 27, 2020.
Prior Publication US 2024/0012342 A1, Jan. 11, 2024
Int. Cl. G03F 9/00 (2006.01); G03F 7/00 (2006.01)
CPC G03F 9/7046 (2013.01) [G03F 7/70625 (2013.01); G03F 7/706831 (2023.05); G03F 7/706837 (2023.05)] 20 Claims
OG exemplary drawing
 
1. A method to determine at least one performance indicator for a metrology process, the performance indicator being indicative of measurement performance for a measurement performed using a first measurement recipe, the method comprising:
obtaining first measurement data relating to one or more setup substrates and a first set of measurement conditions;
determining the first measurement recipe based on the first measurement data; and
determining the at least one performance indicator from:
one or more components of the first measurement data obtained from a component analysis or statistical decomposition; or
a comparison of one or more first measurement values relating to the first measurement recipe and one or more second measurement values relating to a second measurement recipe, wherein the second measurement recipe is determined based on second measurement data, the second measurement data being different to the first measurement data and relating to a second set of measurement conditions, the second set of measurement conditions being different to the first set of measurement conditions.