US 12,189,302 B2
Computational metrology
Wim Tjibbo Tel, Helmond (NL); Bart Peter Bert Segers, Tessenderlo (BE); Everhardus Cornelis Mos, Best (NL); Emil Peter Schmitt-Weaver, Eindhoven (NL); Yichen Zhang, Eindhoven (NL); Petrus Gerardus Van Rhee, Nijmegen (NL); Xing Lan Liu, Ukkel (BE); Maria Kilitziraki, Veldhoven (NL); Reiner Maria Jungblut, Eindhoven (NL); and Hyunwoo Yu, Hwaseong-si (KR)
Assigned to ASML NETHERLANDS B.V., Veldhoven (NL)
Filed by ASML NETHERLANDS B.V., Veldhoven (NL)
Filed on May 6, 2022, as Appl. No. 17/738,093.
Application 17/738,093 is a continuation of application No. 17/197,167, filed on Mar. 10, 2021, granted, now 11,347,150.
Application 17/197,167 is a continuation of application No. 16/481,143, granted, now 10,990,018, previously published as PCT/EP2018/053412, filed on Feb. 12, 2018.
Claims priority of provisional application 62/545,578, filed on Aug. 15, 2017.
Claims priority of provisional application 62/462,201, filed on Feb. 22, 2017.
Prior Publication US 2022/0260925 A1, Aug. 18, 2022
Int. Cl. G03F 7/07 (2006.01); G03F 7/00 (2006.01); G06F 30/20 (2020.01); G06N 3/02 (2006.01); G06F 119/18 (2020.01); G06F 119/22 (2020.01)
CPC G03F 7/70441 (2013.01) [G03F 7/705 (2013.01); G03F 7/70508 (2013.01); G03F 7/70625 (2013.01); G03F 7/70633 (2013.01); G03F 7/70641 (2013.01); G03F 7/70683 (2013.01); G06N 3/02 (2013.01); G06F 30/20 (2020.01); G06F 2119/18 (2020.01); G06F 2119/22 (2020.01)] 22 Claims
OG exemplary drawing
 
1. A method comprising:
obtaining an underlying contribution of a lithographic apparatus to overlay as part of a patterning process; and
combining, by a hardware computer, the underlying contribution with a further contribution to overlay of a substrate to obtain an estimate of overlay for the substrate.