US 12,189,285 B2
Droplet recipe creation method, pattern formation method, and manufacturing method of semiconductor device
Ryo Kobayashi, Kawasaki Kanagawa (JP); and Akihiko Ando, Machida Tokyo (JP)
Assigned to Kioxia Corporation, Tokyo (JP)
Filed by KIOXIA CORPORATION, Tokyo (JP)
Filed on Feb. 28, 2022, as Appl. No. 17/682,827.
Prior Publication US 2023/0088435 A1, Mar. 23, 2023
Int. Cl. G03F 7/00 (2006.01); G03F 7/20 (2006.01); H01L 21/027 (2006.01)
CPC G03F 7/0002 (2013.01) [G03F 7/2018 (2013.01); H01L 21/0274 (2013.01)] 17 Claims
OG exemplary drawing
 
1. A method for generating a droplet recipe used in imprint lithography, the method comprising:
acquiring feature data for a pattern shape formed on a template by measuring the pattern shape of a pattern formed on the template;
calculating, based on the acquired feature data, a dispensing amount for resin to be dispensed on a substrate for filling of the pattern of the template during imprinting of the pattern of the template on the substrate;
calculating a dispensing amount for resin corresponding to a target thickness of a residual film portion formed on the substrate during the imprinting of the pattern of the template on the substrate;
generating, based on the calculated dispensing amounts, a droplet recipe for dispensing of resin during imprinting of the pattern of the template; and
generating an updated droplet recipe based on measurement of a transferred pattern feature formed on the substrate by imprinting of the pattern of the template performed using the previously generated droplet recipe.
 
4. A method for generating a droplet recipe used in imprint lithography, the method comprising:
acquiring feature data for a pattern shape formed on a template by measuring the pattern shape of a pattern formed on the template;
calculating, based on the acquired feature data, a dispensing amount for resin to be dispensed on a substrate for filling of the pattern of the template during imprinting of the pattern of the template on the substrate;
calculating a dispensing amount for resin corresponding to a target thickness of a residual film portion formed on the substrate during the imprinting of the pattern of the template on the substrate;
generating, based on the calculated dispensing amounts, a droplet recipe for dispensing of resin during imprinting of the pattern of the template;
measuring a transferred pattern feature formed on the substrate by imprinting of the pattern of the template; and
correcting the feature data based on the measurement of the transferred pattern on the substrate.
 
6. A method for generating a droplet recipe used in imprint lithography, the method comprising:
acquiring feature data for a pattern shape formed on a template by measuring the pattern shape of a pattern formed on the template;
calculating, based on the acquired feature data, a dispensing amount for resin to be dispensed on a substrate for filling of the pattern of the template during imprinting of the pattern of the template on the substrate;
calculating a dispensing amount for resin corresponding to a target thickness of a residual film portion formed on the substrate during the imprinting of the pattern of the template on the substrate;
generating, based on the calculated dispensing amounts, a droplet recipe for dispensing of resin during imprinting of the pattern of the template;
measuring a thickness of the residual film portion formed on the substrate by imprinting of the template using the droplet recipe; and
generating an updated droplet recipe based on the measured thickness of the residual film portion.