US 12,188,901 B2
Management method, measuring method, measuring device, crystal oscillator sensor, and set
Tetsuya Kamimura, Shizuoka (JP)
Assigned to FUJIFILM Corporation, Tokyo (JP)
Filed by FUJIFILM Corporation, Tokyo (JP)
Filed on Jun. 24, 2022, as Appl. No. 17/848,410.
Application 17/848,410 is a continuation of application No. PCT/JP2020/045451, filed on Dec. 7, 2020.
Claims priority of application No. 2019-237725 (JP), filed on Dec. 27, 2019.
Prior Publication US 2022/0326184 A1, Oct. 13, 2022
Int. Cl. G01N 29/036 (2006.01); G01N 1/14 (2006.01); G01N 1/40 (2006.01); G01N 5/02 (2006.01); G01N 29/02 (2006.01); G01N 29/44 (2006.01)
CPC G01N 29/036 (2013.01) [G01N 1/14 (2013.01); G01N 1/405 (2013.01); G01N 5/02 (2013.01); G01N 29/022 (2013.01); G01N 29/4409 (2013.01); G01N 29/4427 (2013.01); G01N 2291/014 (2013.01); G01N 2291/022 (2013.01); G01N 2291/0256 (2013.01); G01N 2291/02809 (2013.01); G01N 2291/0426 (2013.01)] 34 Claims
OG exemplary drawing
 
1. A management method of managing a purity of a chemical liquid containing an organic solvent by sensing impurities in the chemical liquid, the management method comprising:
Step 1 of preparing a target chemical liquid containing an organic solvent;
Step 2 of bringing the target chemical liquid into contact with a crystal oscillator sensor including an adsorption layer that adsorbs the impurities and a crystal oscillator and obtaining an amount of change in a resonance frequency of the crystal oscillator resulting from contact of the target chemical liquid; and
Step 3 of managing the purity of the chemical liquid by comparing whether or not the obtained amount of change in the resonance frequency falls within a permissible range of the amount of change in the resonance frequency based on a preset purity of the target chemical liquid,
wherein in Step 2, at least a part of a liquid contact portion coming into contact with the target chemical liquid is made of a fluorine-based resin.