US 12,188,125 B2
Showerhead and substrate processing apparatus
Takanobu Hotta, Yamanashi (JP); Takuya Kawaguchi, Yamanashi (JP); Hideaki Yamasaki, Yamanashi (JP); Toshio Takagi, Yamanashi (JP); and Takashi Kakegawa, Yamanashi (JP)
Assigned to Tokyo Electron Limited, Tokyo (JP)
Filed by Tokyo Electron Limited, Tokyo (JP)
Filed on Jun. 2, 2022, as Appl. No. 17/805,062.
Claims priority of application No. 2021-097605 (JP), filed on Jun. 10, 2021.
Prior Publication US 2022/0396875 A1, Dec. 15, 2022
Int. Cl. C23C 16/455 (2006.01); C23C 16/44 (2006.01)
CPC C23C 16/45565 (2013.01) [C23C 16/4412 (2013.01)] 8 Claims
OG exemplary drawing
 
1. A showerhead comprising:
a shower plate;
a base member in which a gas flow passage is provided, the base member fixing the shower plate;
a plurality of gas supply members disposed in a gas diffusion space and connected to the gas flow passage, the gas diffusion space being formed between the shower plate and the base member; and
a plurality of linear flow adjusting plates disposed in the gas diffusion space, the plurality of linear flow adjusting plates being disposed on an outer periphery on an outer side from the plurality of gas supply members such that gas flows between two adjacent flow adjusting plates among the plurality of linear flow adjusting plates,
wherein each of the plurality of linear flow adjusting plates is tilted at a predetermined angle with respect to a line extending from a center of the showerhead in a radial direction.