US 12,188,119 B2
Magnet system and sputtering device
Klaus Schneider, Arnsdorf (DE); Goetz Grosser, Dresden (DE); Thorsten Sander, Dresden (DE); and Ralf Hauswald, Bad Schandau (DE)
Assigned to VON ARDENNE Asset GmbH & CoKG, Dresden (DE)
Filed by VON ARDENNE Asset GmbH & Co. KG, Dresden (DE)
Filed on Nov. 11, 2022, as Appl. No. 18/054,574.
Claims priority of application No. 10 2021 129 524.6 (DE), filed on Nov. 12, 2021.
Prior Publication US 2023/0151477 A1, May 18, 2023
Int. Cl. C23C 14/35 (2006.01); H01F 7/02 (2006.01)
CPC C23C 14/35 (2013.01) [H01F 7/02 (2013.01)] 20 Claims
OG exemplary drawing
 
1. A magnet system for a sputtering device, the magnet system comprising:
a bearing frame;
a magnet holder comprising a first mounting area and a second mounting area;
a first support device mounted to the magnet holder by means of the first mounting area;
a second support device mounted to the magnet holder by means of the second mounting area, wherein at least one of the first mounting area and the second mounting area is configured such that mounting positions at which the first support device and the second support device are mounted to the magnet holder are movable relative to each other, wherein the first support device and the second support device are configured to form, when assembled with the bearing frame, a bearing device for storing the magnet holder.