US 12,187,920 B2
Polishing agent for synthetic quartz glass substrate and producing method for polishing agent, and method for polishing synthetic quartz glass substrate
Mitsuhito Takahashi, Annaka (JP)
Assigned to SHIN-ETSU CHEMICAL CO., LTD., Tokyo (JP)
Appl. No. 17/921,407
Filed by SHIN-ETSU CHEMICAL CO., LTD., Tokyo (JP)
PCT Filed Mar. 12, 2021, PCT No. PCT/JP2021/009942
§ 371(c)(1), (2) Date Oct. 26, 2022,
PCT Pub. No. WO2021/235054, PCT Pub. Date Nov. 25, 2021.
Claims priority of application No. 2020-088522 (JP), filed on May 21, 2020.
Prior Publication US 2023/0159792 A1, May 25, 2023
Int. Cl. C09G 1/02 (2006.01); C03C 15/02 (2006.01)
CPC C09G 1/02 (2013.01) [C03C 15/02 (2013.01)] 8 Claims
OG exemplary drawing
 
1. A polishing agent for a synthetic quartz glass substrate, the polishing agent comprising at least:
polishing particles; and
water,
wherein the polishing particles contain: composite oxide particles of cerium and yttrium; and composite amorphous particles of cerium and yttrium, and
the composite oxide particles of cerium and yttrium have an average primary particle diameter of 30 nm or more and 80 nm or less, and the composite amorphous particles of cerium and yttrium have an average primary particle diameter of 100 nm or more and 300 nm or less.