CPC C09G 1/02 (2013.01) [C03C 15/02 (2013.01)] | 8 Claims |
1. A polishing agent for a synthetic quartz glass substrate, the polishing agent comprising at least:
polishing particles; and
water,
wherein the polishing particles contain: composite oxide particles of cerium and yttrium; and composite amorphous particles of cerium and yttrium, and
the composite oxide particles of cerium and yttrium have an average primary particle diameter of 30 nm or more and 80 nm or less, and the composite amorphous particles of cerium and yttrium have an average primary particle diameter of 100 nm or more and 300 nm or less.
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