	US 12,187,618 B2
	Silica particle dispersion liquid and production method thereof
Miki Egami, Kitakyushu (JP); Mitsuaki Kumazawa, Kitakyushu (JP); Ryo Muraguchi, Kitakyushu (JP); and Michio Komatsu, Kitakyushu (JP)
Assigned to JGC CATALYSTS AND CHEMICALS LTD., Kanagawa (JP)
Filed by JGC CATALYSTS AND CHEMICALS LTD., Kanagawa (JP)
Filed on Sep. 23, 2020, as Appl. No. 17/029,716.
Claims priority of application No. 2019-180613 (JP), filed on Sep. 30, 2019.
Prior Publication US 2021/0094832 A1, Apr. 1, 2021
Int. Cl. C01B 33/141 (2006.01); C09G 1/02 (2006.01); C09K 3/14 (2006.01)

CPC C01B 33/141 (2013.01) [C09G 1/02 (2013.01); C09K 3/1409 (2013.01); C01P 2004/62 (2013.01); C01P 2004/64 (2013.01); C01P 2004/90 (2013.01); C01P 2006/10 (2013.01)]

6 Claims

1. A silica particle dispersion liquid, which is used for polishing, comprising a silica particle that satisfies (i) to (iv) below: (i) an average particle diameter d is 5 to 300 nm; (ii) an occlusion amount of a basic substance per 1 g of the particle is 2 mg or more; (iii) a Sears number Y exceeds 12.0; (iv) a density p of 1.00 g/cm3 or less; and a coefficient of variance for the average particle diameter d of the silica particle is 10% or less, wherein the silica particle has a plurality of pores that occludes the basic substance.