US 12,187,053 B2
Liquid ejecting apparatus, method for controlling liquid ejecting apparatus, and non-transitory computer-readable storage medium preliminary
Atsushi Sumii, Shiojiri (JP); and Keisuke Niwa, Chino (JP)
Assigned to Seiko Epson Corporation, Tokyo (JP)
Filed by SEIKO EPSON CORPORATION, Tokyo (JP)
Filed on Jan. 15, 2023, as Appl. No. 18/154,830.
Claims priority of application No. 2022-005596 (JP), filed on Jan. 18, 2022; application No. 2022-046494 (JP), filed on Mar. 23, 2022; and application No. 2022-140568 (JP), filed on Sep. 5, 2022.
Prior Publication US 2023/0226837 A1, Jul. 20, 2023
Int. Cl. B41J 29/17 (2006.01)
CPC B41J 29/17 (2013.01) 14 Claims
OG exemplary drawing
 
1. A liquid ejecting apparatus comprising:
a liquid ejecting portion that ejects a liquid onto a medium;
a transport belt that faces the liquid ejecting portion and rotates in a normal rotation direction to transport the medium downstream in a transport direction;
a cleaner that makes contact with the transport belt to clean a cleaning region on the transport belt, in which the cleaner is configured to be switched between a contact state of being in contact with the transport belt and a separation state of being separated from the transport belt and is switched from the separation state to the contact state when cleaning the transport belt; and
a control portion that controls an ejecting operation of the liquid by the liquid ejecting portion, a rotating operation of the transport belt, and switching of a state of the cleaner, wherein
when, in cleaning the cleaning region, at least a part of the cleaning region is located, in the normal rotation direction of the transport belt, downstream of a contact position where the cleaner is in contact with the transport belt, the control portion is configured to execute, before the cleaner is switched from the separation state to the contact state, cleaning position adjustment control to rotate the transport belt in a reverse rotation direction opposite to the normal rotation direction so that an entire of the cleaning region is located upstream of the contact position in the normal rotation direction.