US 12,186,832 B2
Pulse train annealing method and apparatus
Stephen Moffatt, St. Brelade (JE); and Joseph M. Ranish, San Jose, CA (US)
Assigned to Applied Materials, Inc., Santa Clara, CA (US)
Filed by Applied Materials, Inc., Santa Clara, CA (US)
Filed on Mar. 16, 2021, as Appl. No. 17/203,239.
Application 17/203,239 is a division of application No. 15/353,279, filed on Nov. 16, 2016, granted, now 11,040,415.
Application 15/353,279 is a continuation of application No. 13/707,476, filed on Dec. 6, 2012, granted, now 9,498,845, issued on Nov. 22, 2016.
Application 13/707,476 is a continuation of application No. 12/853,155, filed on Aug. 9, 2010, abandoned.
Application 12/853,155 is a continuation of application No. 12/173,967, filed on Jul. 16, 2008, granted, now 7,800,081, issued on Sep. 21, 2010.
Claims priority of provisional application 60/986,550, filed on Nov. 8, 2007.
Prior Publication US 2021/0220949 A1, Jul. 22, 2021
This patent is subject to a terminal disclaimer.
Int. Cl. B23K 26/352 (2014.01); B23K 26/00 (2014.01); B23K 26/0622 (2014.01); B23K 26/08 (2014.01); B23K 26/12 (2014.01); B23K 26/354 (2014.01); B23K 103/00 (2006.01); F27B 5/18 (2006.01); F27D 19/00 (2006.01); F27D 21/00 (2006.01); H01L 21/225 (2006.01); H01L 21/268 (2006.01); H01L 21/324 (2006.01); H01L 21/67 (2006.01); F27B 5/14 (2006.01)
CPC B23K 26/352 (2015.10) [B23K 26/0006 (2013.01); B23K 26/0622 (2015.10); B23K 26/0853 (2013.01); B23K 26/123 (2013.01); B23K 26/126 (2013.01); B23K 26/354 (2015.10); F27B 5/18 (2013.01); F27D 21/00 (2013.01); H01L 21/2253 (2013.01); H01L 21/268 (2013.01); H01L 21/324 (2013.01); H01L 21/67115 (2013.01); B23K 2103/56 (2018.08); F27B 5/14 (2013.01); F27D 2019/0003 (2013.01); F27D 21/0014 (2013.01)] 18 Claims
OG exemplary drawing
 
1. An apparatus for treating a substrate, comprising:
a first laser apparatus comprising a switch and a laser radiation source, wherein the switch directly interrupts a laser radiation supplied by the laser radiation source;
a substrate support movably disposed along an optical path of the laser radiation;
a capacitor and a power supply, wherein the power supply is configured to charge the capacitor;
a controller coupled to the substrate support, the power supply, and the switch, wherein the controller is configured to operate the switch to generate a pulse train of electromagnetic radiation; and
an optical assembly disposed along the optical path of the laser radiation between the first laser apparatus and the substrate support, wherein the optical assembly is positioned to receive the pulses of electromagnetic radiation and direct a pulse train of temporally shaped pulses of electromagnetic radiation, wherein the duration of each pulse is about 1 nsec to about 10 msec.