CPC G03F 7/162 (2013.01) [B05B 9/002 (2013.01); B05C 11/1042 (2013.01); H01L 21/6715 (2013.01); H01L 21/67017 (2013.01); H01L 21/67248 (2013.01); H01L 21/68764 (2013.01); H01L 21/0273 (2013.01)] | 14 Claims |
1. A liquid treatment apparatus comprising:
a substrate holder configured to hold a substrate;
a discharge nozzle configured to discharge a treatment liquid onto the substrate held by the substrate holder;
a liquid supply pipe configured to supply the treatment liquid from a treatment liquid storage source to the discharge nozzle;
a gas pipe;
a processing container in which the substrate holder, the discharge nozzle, the liquid supply pipe, and the gas pipe are provided;
an atmosphere gas supply part configured to supply an atmosphere gas into the processing container; and
an introduction pipe configured to introduce an inert gas from an inert gas storage source into the processing container,
wherein the gas pipe includes:
an encompassing portion that encompasses the liquid supply pipe and through which the inert gas flows in a space between the gas pipe and the liquid supply pipe; and
an extension portion that does not encompass the liquid supply pipe and is disposed between an upstream end of the gas pipe inside the processing container and the encompassing portion, and through which the inert gas flows, and
wherein the extension portion of the gas pipe is folded back inside the processing container in a plan view.
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