US 11,855,074 B2
Electrostatic discharge devices
Zhiqing Li, Halfmoon, NY (US); William J. Taylor, Jr., Clifton Park, NY (US); and Anindya Nath, Essex Junction, VT (US)
Assigned to GLOBALFOUNDRIES U.S. INC., Malta, NY (US)
Filed by GLOBALFOUNDRIES U.S. Inc., Santa Clara, CA (US)
Filed on Feb. 8, 2021, as Appl. No. 17/170,325.
Prior Publication US 2022/0254773 A1, Aug. 11, 2022
Int. Cl. H01L 27/02 (2006.01)
CPC H01L 27/0262 (2013.01) 19 Claims
OG exemplary drawing
 
1. A structure comprising:
a plurality of regions of a first dopant type;
insulator material separating each region of the plurality of regions of the first dopant type;
a substrate contacting the plurality of regions of the first dopant type, the substrate comprising a base region of a second dopant type different than the first dopant type and an L-shaped outer segment surrounding the plurality of regions of the first dopant type, the L-shaped outer segment comprises an electrical resistivity higher than other portions of the base region; and
a shallow trench isolation structure confined between both legs of the L-shaped outer segment and an outer one of the plurality of regions of the first dopant type.