US 11,854,813 B2
Low temperature deposition of pure molybenum films
Kunal Bhatnagar, Chandler, AZ (US); Dmitrii Leshchev, Gatchina (RU); Mohith Verghese, Phoenix, AZ (US); and Jose Alexandro Romero, Scottsdale, AZ (US)
Assigned to Applied Materials, Inc., Santa Clara, CA (US)
Filed by Applied Materials, Inc., Santa Clara, CA (US)
Filed on Feb. 24, 2021, as Appl. No. 17/183,474.
Prior Publication US 2022/0270883 A1, Aug. 25, 2022
Int. Cl. H01L 21/285 (2006.01); C23C 16/44 (2006.01); C23C 16/455 (2006.01); C23C 16/14 (2006.01)
CPC H01L 21/28556 (2013.01) [C23C 16/14 (2013.01); C23C 16/4408 (2013.01); C23C 16/45553 (2013.01)] 10 Claims
OG exemplary drawing
 
1. A method of depositing a film, the method comprising:
exposing a substrate to a molybdenum halide precursor and an aluminum precursor to form a molybdenum film on the substrate, wherein the substrate is exposed to the molybdenum halide precursor and the aluminum precursor simultaneously.