| CPC H01G 4/33 (2013.01) [H01G 4/008 (2013.01); H01G 4/012 (2013.01); H01G 4/145 (2013.01); H01G 4/306 (2013.01); Y10T 29/435 (2015.01)] | 6 Claims |
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1. A manufacturing method of a thin film high polymer laminated capacitor, comprising:
a first laminate manufacturing process including
vapor-depositing a monomer on an outer periphery of a rotary drum rotated in a circumferential direction in a vacuum chamber to form a monomer layer,
irradiating a beam on the monomer layer to form a dielectric layer,
coating an oil on the formed dielectric layer,
vapor-depositing, from a first metal deposition source, a first metal on the dielectric layer having the oil coated thereon, so as to form a first metal layer with internal electrode parts and edge parts adjacent to inner margin regions where the first metal is not deposited due to the oil coated on the dielectric layer, and
vapor-depositing, from a second metal deposition source, a second metal on the edge parts of the first metal layer, so as to form a second metal layer on the edge parts to form heavy edges,
further laminate manufacturing processes, each repeating the first laminate manufacturing process on the first metal layer and the second metal layer so that each second metal layer is laminated above another second metal layer with one first metal layer and one dielectric layer interposed therebetween to thereby form a first laminate having the first metal layers and the second metal layers with capacitor function regions between two second metal layers and the edge parts, and
a cutting process of cutting the first laminate at the second metal layers to form a second laminate with layers from each laminate manufacturing process each having one heavy edge part on one side of the capacitor function region and another heavy edge part on a side of the capacitor function region opposite to the one side,
wherein a vapor deposition mask is arranged between the rotary drum and the second metal deposition source in the vacuum chamber to shield an area which becomes a first part for forming the capacitor function region during the vapor-depositing of the second metal, to thereby allow for the laminate manufacturing processes to continuously form the areas which become the first parts where the inner margin parts are formed and parts which become the edge parts with the heavy edges where the second metal layers are deposited.
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