CPC G03F 7/0045 (2013.01) [G03F 7/2004 (2013.01); G03F 7/2041 (2013.01); G03F 7/30 (2013.01)] | 17 Claims |
1. A photoresist composition, comprising:
an acid-sensitive polymer comprising a repeating unit having an acid-labile group;
an iodonium salt comprising an anion and a cation, wherein the cation comprises one, and not more than one, iodonium cation, the iodonium salt having Formula (1):
wherein,
Z− is an organic anion comprising a group chosen from sulfonate, a methide anion, an anion of a sulfonamide, an anion of a sulfonimide, a sulfamate, a phenolate, or carboxylate;
Ar1 is a substituted or unsubstituted C4-60 heteroaryl group comprising a furan heterocycle; and
R1 is a C1-20 alkyl group, a C1-20 heteroalkyl group, a C3-20 cycloalkyl group, a C2-20 heterocycloalkyl group, a C2-20 alkenyl group, a C2-20 heteroalkenyl group, a C6-30 aryl group, a C4-30 heteroaryl group, a C7-20 arylalkyl group, or a C4-20 heteroarylalkyl group, each of which is substituted or unsubstituted,
wherein the cation optionally comprises an acid-labile group,
wherein Ar1 and R1 are optionally connected to each other via a single bond or one or more divalent linking groups to form a ring, and
wherein the iodonium salt is optionally covalently bonded through Ar1 or through a substituent thereof as a pendant group to a polymer, the iodonium salt is optionally covalently bonded through R1 or through a substituent thereof as a pendant group to a polymer, or the iodonium salt is optionally covalently bonded through Z− as a pendant group to a polymer; and
a solvent.
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