US 11,851,771 B1
Method for constructing porous micro-nano structure, and material with porous micro-nano structure
Xinghua Wu, Guangzhou (CN); Guohuang Tan, Guangzhou (CN); Minghao Xiao, Guangzhou (CN); and Wei Meng, Guangzhou (CN)
Assigned to GUANGDONG UNIVERSITY OF TECHNOLOGY, Guangzhou (CN)
Filed by GUANGDONG UNIVERSITY OF TECHNOLOGY, Guangzhou (CN)
Filed on May 11, 2023, as Appl. No. 18/316,196.
Claims priority of application No. 202210542970.9 (CN), filed on May 18, 2022.
Int. Cl. B29C 33/42 (2006.01); C23C 4/12 (2016.01); C23C 4/18 (2006.01); C23C 4/11 (2016.01); C09D 1/00 (2006.01); C09D 5/16 (2006.01)
CPC C23C 4/12 (2013.01) [C23C 4/11 (2016.01); C23C 4/18 (2013.01); C09D 1/00 (2013.01); C09D 5/1681 (2013.01)] 6 Claims
OG exemplary drawing
 
1. A method for constructing a porous micro-nano structure, comprising the following steps:
(1) thoroughly mixing glass powders and metal powders to obtain a mixture, wherein particle sizes of the glass powders are in a range from 500 mesh to 3,000 mesh and particle sizes of the metal powders are in a range from 50 nm to 100 μm;
(2) cleaning a surface of a substrate to be coated, and drying the surface for later use;
(3) coating the mixture onto the surface of the substrate, and conducting a film-forming treatment to form a coating on the surface of the substrate, wherein a temperature of the film-forming treatment and a melting point of the glass powders comply with the following formula:
Tforming≥Tglass−50° C.,
wherein Tforming represents the temperature of the film-forming treatment and Tglass represents the melting point of the glass powders; and the temperature of the film-forming treatment is in a range from 100° C. to 1,500° C.; and
(4) constructing a surface structure of the coating to obtain a porous micro-nano structure coating on the surface of the substrate, wherein a surface of the porous micro-nano structure coating has a porous micro-nano structure; and a method for constructing the surface structure comprises one or a combination of two or more selected from a group consisting of acid etching treatment, alkali etching treatment, and anodic oxidation treatment.