US 11,851,753 B2
Process for manufacturing a silicon carbide coated body
Peter J. Guercio, Queen Creek, AZ (US); Paul Westphal, Scottsdale, AZ (US); and Kirk Allen Fisher, Tempe, AZ (US)
Assigned to Applied Materials, Inc., Santa Clara, CA (US)
Appl. No. 16/957,571
Filed by Applied Materials, Inc., Santa Clara, CA (US)
PCT Filed Dec. 22, 2018, PCT No. PCT/US2018/067414
§ 371(c)(1), (2) Date Jun. 24, 2020,
PCT Pub. No. WO2019/133556, PCT Pub. Date Jul. 4, 2019.
Claims priority of provisional application 62/610,658, filed on Dec. 27, 2017.
Claims priority of application No. 18152232 (EP), filed on Jan. 18, 2018.
Prior Publication US 2020/0325575 A1, Oct. 15, 2020
This patent is subject to a terminal disclaimer.
Int. Cl. C23C 16/00 (2006.01); C23C 16/32 (2006.01); C01B 32/21 (2017.01); C23C 16/04 (2006.01)
CPC C23C 16/325 (2013.01) [C01B 32/21 (2017.08); C23C 16/045 (2013.01)] 11 Claims
OG exemplary drawing
 
1. A method of depositing a silicon carbide coating on a substrate by chemical vapor deposition (CVD) using a dimethyldichlorosilane precursor material, wherein the dimethyldichlorosilane precursor material comprises:
(A) dimethyldichlorosilane as a main component and
(B) at least one further component being a siloxane compound or a mixture of siloxane compounds, wherein a content of the at least one further component (B) is >0 to 2.00 wt. % relative to the dimethyldichlorosilane precursor material.