	US 11,851,742 B2
	Vapor deposition method for preparing an amorphous lithium borosilicate
Gianfranco Aresta, Southampton (GB); David Michael Laughman, Acton, MA (US); Brian Elliott Hayden, Lyndhurst (GB); and Samuel Guerin, Southampton (GB)
Assigned to ILIKA TECHNOLOGIES LIMITED, Romsey (GB)
Appl. No. 17/261,768
Filed by ILIKA TECHNOLOGIES LIMITED, Romsey (GB)
PCT Filed Aug. 29, 2019, PCT No. PCT/GB2019/052406 § 371(c)(1), (2) Date Jan. 20, 2021, PCT Pub. No. WO2020/044042, PCT Pub. Date Mar. 5, 2020.
Claims priority of application No. 1814039 (GB), filed on Aug. 29, 2018.
Prior Publication US 2021/0262079 A1, Aug. 26, 2021
Int. Cl. C23C 14/08 (2006.01); C03C 3/064 (2006.01); C03C 4/14 (2006.01); C23C 14/00 (2006.01); H01M 4/136 (2010.01); H01M 4/1397 (2010.01)

CPC C23C 14/08 (2013.01) [C03C 3/064 (2013.01); C03C 4/14 (2013.01); C23C 14/0021 (2013.01); H01M 4/136 (2013.01); H01M 4/1397 (2013.01); C03C 2204/00 (2013.01)]

15 Claims

1. A vapour deposition method for preparing an amorphous lithium borosilicate compound or doped lithium borosilicate compound, the method comprising:

providing a vapour source of each component element of the compound, wherein the vapour sources comprise at least a source of lithium, a source of oxygen, a source of boron, and a source of silicon, and, optionally, a source of at least one dopant element;

providing a substrate;

delivering a flow of said lithium, said oxygen, said boron and said silicon, and, optionally, said dopant element, wherein the rate of flow of said oxygen is at least about 8×10⁻⁸m³/s; and

co-depositing the component elements from the vapour sources onto the substrate, wherein:

the component elements react on the substrate to form the amorphous compound; and

the substrate is provided at a temperature of 110° C. when the component elements from the vapour sources are co-deposited onto the substrate, the temperature of the substrate resulting in a relative dominance of silicate and orthosilicate from the co-deposition of the component elements.