US 11,851,380 B2
Slurry processing for deposition of rare earth hafnium tantalate based barrier coatings
Glen Harold Kirby, Liberty Township, OH (US); and Evin Nathaniel Barber, Cincinnati, OH (US)
Assigned to General Electric Company, Schenectady, NY (US)
Filed by General Electric Company, Schenectady, NY (US)
Filed on May 26, 2021, as Appl. No. 17/330,514.
Prior Publication US 2022/0380268 A1, Dec. 1, 2022
Int. Cl. C04B 41/00 (2006.01)
CPC C04B 41/009 (2013.01) [C04B 2235/3224 (2013.01)] 20 Claims
OG exemplary drawing
 
1. A method of forming a coating on a surface of a substrate, the method comprising:
applying a slurry onto the surface of the substrate to form a coating, wherein the slurry comprises a rare earth compound dispersed within a solvent, wherein the rare earth compound has the formula: A1-bBbZ1-dDdMO6 where A is Al, Ga, In, Sc, Y, Ce, Pr, Nd, Pm, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb, Lu, Fe, Cr, Co, Mn, Bi, or a mixture thereof; b is 0 to about 0.5; Z is Hf, Ti, or a mixture thereof; D is Zr, Ce, Ge, Si, Ru, or a mixture thereof; d is 0 to about 0.5; and M is Ta, Nb, or a mixture thereof, the rare earth compound being a plurality of particles having a particle size distribution of D50 of about 0.2 μm to about 20 μm and D95 of about 10 μm to about 30 μm; and
densifying the coating at a sintering temperature between about 1300° C. to about 1600° C.