US 11,837,489 B2
Electrostatic chuck device and production method for electrostatic chuck device
Hironori Kugimoto, Tokyo (JP); and Norito Morishita, Tokyo (JP)
Assigned to SUMITOMO OSAKA CEMENT CO., LTD., Tokyo (JP)
Appl. No. 16/981,622
Filed by SUMITOMO OSAKA CEMENT CO., LTD., Tokyo (JP)
PCT Filed Mar. 22, 2019, PCT No. PCT/JP2019/012050
§ 371(c)(1), (2) Date Sep. 16, 2020,
PCT Pub. No. WO2019/182104, PCT Pub. Date Sep. 26, 2019.
Claims priority of application No. 2018-055619 (JP), filed on Mar. 23, 2018.
Prior Publication US 2021/0020489 A1, Jan. 21, 2021
Int. Cl. H01L 21/683 (2006.01); H01J 37/32 (2006.01); H01L 21/687 (2006.01)
CPC H01L 21/6833 (2013.01) [H01J 37/32724 (2013.01); H01L 21/68757 (2013.01)] 18 Claims
OG exemplary drawing
 
1. An electrostatic chuck device comprising:
a base having one main surface serving as a mounting surface on which a plate-shaped sample is mounted; and
an electrode for electrostatic attraction provided on a side opposite to the mounting surface in the base or in an interior of the base,
wherein the electrode for electrostatic attraction is made of a composite sintered body that includes a matrix phase having insulation properties and a dispersed phase having a lower volume resistivity value than the matrix phase, and
wherein the dispersed phase of the composite sintered body comprises a plurality of aggregated portions comprising metal, silicon, and carbon, the aggregated portions each having a Maximum Feret Diameter of 30 μm or more, the Maximum Feret Diameter being the maximum value of the interval between two parallel lines when a measurement region of each aggregated portion is sandwiched between the two parallel lines.