CPC G03F 7/0045 (2013.01) [G03F 7/0392 (2013.01); G03F 7/2004 (2013.01); G03F 7/32 (2013.01)] | 7 Claims |
1. A resist composition which generates an acid upon exposure and exhibits changed solubility in a developing solution under action of acid, the resist composition comprising:
a base material component (A) which exhibits changed solubility in a developing solution under action of acid; and
an acid generator component (B) which generates an acid upon exposure,
wherein the acid generator component (B) contains a first acid generator and a second acid generator,
the first acid generator is a compound (B1) represented by General Formula (b1),
the second acid generator is a compound (B2) represented by General Formula (b2-1) including a cation moiety and an anion moiety having a molar volume of 250 cm3/mol or less, and
the molar volume of the anion moiety of the compound (B2) is smaller than a molar volume of the anion moiety of the compound (B1):
wherein in formula (b1) Rb0 represents a condensed cyclic group containing a condensed ring having at least one aromatic ring, Yb 0 represents a divalent linking group or a single bond, Vb0 represents a single bond, an alkylene group, or a fluorinated alkylene group, Rc1 represents an aryl group having an electron-withdrawing group, and Rc2 and Rc3 each independently represent an aryl group which may have a substituent, or Rc2 and Rc3 are bonded to each other to form a ring together with a sulfur atom in the formula,
and wherein in formula (b2-1), R101 represents a cyclic group which may have a substituent, a chain alkyl group which may have a substituent, or a chain alkenyl group which may have a substituent, R102 represents a fluorinated alkyl group having 1 to 5 carbon atoms or a fluorine atom, Y101 represents a divalent linking group containing an oxygen atom or a single bond, V101 represents a single bond, an alkylene group, or a fluorinated alkylene group, and M′m+ represents an m-valent onium cation.
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