US 11,835,857 B2
Resist composition and method of forming resist pattern
Yuta Iwasawa, Kawasaki (JP); Yosuke Suzuki, Kawasaki (JP); and Tasuku Matsumiya, Kawasaki (JP)
Assigned to Tokyo Ohka Kogyo Co., Ltd., Kawasaki (JP)
Filed by TOKYO OHKA KOGYO CO., LTD., Kawasaki (JP)
Filed on Jun. 23, 2021, as Appl. No. 17/304,620.
Claims priority of application No. 2020-113267 (JP), filed on Jun. 30, 2020.
Prior Publication US 2021/0405527 A1, Dec. 30, 2021
Int. Cl. G03F 7/004 (2006.01); G03F 7/039 (2006.01); G03F 7/20 (2006.01); G03F 7/32 (2006.01)
CPC G03F 7/0045 (2013.01) [G03F 7/0392 (2013.01); G03F 7/2004 (2013.01); G03F 7/32 (2013.01)] 7 Claims
 
1. A resist composition which generates an acid upon exposure and exhibits changed solubility in a developing solution under action of acid, the resist composition comprising:
a base material component (A) which exhibits changed solubility in a developing solution under action of acid; and
an acid generator component (B) which generates an acid upon exposure,
wherein the acid generator component (B) contains a first acid generator and a second acid generator,
the first acid generator is a compound (B1) represented by General Formula (b1),
the second acid generator is a compound (B2) represented by General Formula (b2-1) including a cation moiety and an anion moiety having a molar volume of 250 cm3/mol or less, and
the molar volume of the anion moiety of the compound (B2) is smaller than a molar volume of the anion moiety of the compound (B1):

OG Complex Work Unit Chemistry
wherein in formula (b1) Rb0 represents a condensed cyclic group containing a condensed ring having at least one aromatic ring, Yb 0 represents a divalent linking group or a single bond, Vb0 represents a single bond, an alkylene group, or a fluorinated alkylene group, Rc1 represents an aryl group having an electron-withdrawing group, and Rc2 and Rc3 each independently represent an aryl group which may have a substituent, or Rc2 and Rc3 are bonded to each other to form a ring together with a sulfur atom in the formula,

OG Complex Work Unit Chemistry
and wherein in formula (b2-1), R101 represents a cyclic group which may have a substituent, a chain alkyl group which may have a substituent, or a chain alkenyl group which may have a substituent, R102 represents a fluorinated alkyl group having 1 to 5 carbon atoms or a fluorine atom, Y101 represents a divalent linking group containing an oxygen atom or a single bond, V101 represents a single bond, an alkylene group, or a fluorinated alkylene group, and M′m+ represents an m-valent onium cation.