US 11,835,826 B2
Counter substrate and display panel
Jian Ma, Beijing (CN); Jinliang Hu, Beijing (CN); Chengyong Zhan, Beijing (CN); and Wenming Ren, Beijing (CN)
Assigned to HEFEI XINSHENG OPTOELECTRONICS TECHNOLOGY CO., LTD., Anhui (CN); and BOE TECHNOLOGY GROUP CO., LTD., Beijing (CN)
Filed by Hefei Xinsheng Optoelectronics Technology Co., Ltd., Anhui (CN); and BOE Technology Group Co., Ltd., Beijing (CN)
Filed on Sep. 29, 2022, as Appl. No. 17/955,849.
Application 17/955,849 is a continuation of application No. 17/358,052, filed on Jun. 25, 2021, granted, now 11,500,249.
Claims priority of application No. 202023183906.1 (CN), filed on Dec. 25, 2020.
Prior Publication US 2023/0023604 A1, Jan. 26, 2023
Int. Cl. G02F 1/1339 (2006.01); G02F 1/1335 (2006.01)
CPC G02F 1/13394 (2013.01) [G02F 1/133512 (2013.01); G02F 1/133514 (2013.01)] 18 Claims
OG exemplary drawing
 
1. A counter substrate comprising a display area and a non-display area arranged around the display area, wherein the counter substrate comprises a base substrate, a photo spacer (PS) pattern layer formed on the base substrate and an alignment film covering the PS pattern layer, a surface of the PS pattern layer away from the base substrate is a support surface, and the PS pattern layer comprises:
a plurality of main PSs, located in the display area, and each having a pillar shape;
at least one peripheral barrier wall, located in the non-display area and arranged at at least one side of the display area, the peripheral barrier wall substantially having an elongated-strip shape and having a same length direction as that of a display area side, corresponding to the peripheral barrier wall, of the display area, the support surface of the peripheral barrier wall being closer to the base substrate than the support surface of the main PS, and a distance between the support surface of the peripheral barrier wall and the support surface of the main PS in a thickness direction of the base substrate being a first distance; and
at least one first peripheral PS group, arranged on the non-display area, the first peripheral PS group being located at least at a side of the peripheral barrier wall away from the display area and comprising a plurality of first peripheral PSs spaced apart from each other along the length direction of the peripheral barrier wall corresponding to the first peripheral PS group, and the first peripheral PS having a pillar shape,
wherein a ratio between a width of the support surface of the peripheral barrier wall and the first distance is less than 100,
wherein the PS pattern layer further comprises:
at least one second peripheral PS group, arranged on the non-display area, the second peripheral PS group being located at least at a side of the peripheral barrier wall close to the display area,
wherein the second peripheral PS group comprises a plurality of second peripheral PSs spaced apart from each other along the length direction of the peripheral barrier wall corresponding to the second peripheral PS group, the second peripheral PS has a pillar shape, and the support surface of the second peripheral PS and the support surface of the peripheral barrier wall are in a same plane.