US 11,814,716 B2
Faceplate having blocked center hole
Fang Ruan, Milpitas, CA (US); Prashant Kumar Kulshreshtha, San Jose, CA (US); Jiheng Zhao, San Jose, CA (US); and Diwakar Kedlaya, San Jose, CA (US)
Assigned to Applied Materials, Inc., Santa Clara, CA (US)
Filed by Applied Materials, Inc., Santa Clara, CA (US)
Filed on Nov. 27, 2019, as Appl. No. 16/698,448.
Prior Publication US 2021/0156028 A1, May 27, 2021
Int. Cl. C23C 16/455 (2006.01); H01J 37/32 (2006.01); H01L 21/3213 (2006.01)
CPC C23C 16/45565 (2013.01) [H01J 37/32449 (2013.01); H01J 37/32633 (2013.01); H01L 21/32136 (2013.01)] 17 Claims
OG exemplary drawing
 
1. A semiconductor processing chamber comprising:
a gasbox;
a substrate support;
a blocker plate positioned between the gasbox and the substrate support, wherein the blocker plate defines a plurality of blocker plate apertures through the blocker plate; and
a faceplate positioned between the blocker plate and the substrate support, wherein the faceplate is characterized by a first surface facing the blocker plate and a second surface opposite the first surface, wherein the second surface of the faceplate and the substrate support at least partially define a processing region within the semiconductor processing chamber, wherein the faceplate is characterized by a central axis, wherein the faceplate defines a plurality of faceplate apertures through the faceplate, wherein the faceplate defines a central recess about the central axis extending from the second surface of the faceplate to a depth less than a thickness of the faceplate, and
wherein the central recess defines a blind hole, and
wherein each faceplate aperture comprises an aperture profile characterized by a first section extending from the first surface to a position partially through the faceplate, and further characterized by a second section extending from the position partially through the faceplate to the second surface, wherein the central recess is characterized by a substantially identical profile as the second section of the aperture profile of each faceplate aperture.